Inventions in Diffusing Dopant In Semiconductor category
Introduction
Diffusing Dopant In Semiconductor is one of those areas that honestly has a lot of new inventions coming up almost every day. Of course, quality is more important than quantity but dont' forget about the element of chance. In higher sample size there is that higher probablity of somethign useful coming up.
Patented Inventions in Diffusing Dopant In Semiconductor
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METHOD OF FABRICATING SEMICONDUCTOR DEVICE
Here are few examples in this category: A METHOD OF FABRICATING SEMICONDUCTOR DEVICE, which seems to be dated Thu, 13 Dec 2007 00:00:00 -0800. This one is quite interesting for Diffusing Dopant In Semiconductor category. First of all it is very futuristic; I guess everything new that is invented has to be in one way or another futuristic. Anyways, the point here is that this invention has some good potential for future. Inventors of this project were Semiconductor Energy Laboratory Co., Ltd.. The idea behind the it is very odd in a good way.
Let’s say see what the actual authors say about them: .
Here is its drawing
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Photoactive compositions for liquid deposition
Here are few examples in this category: A Photoactive compositions for liquid deposition, which seems to be dated Thu, 29 Dec 2005 00:00:00 -0800. This one is quite interesting for Diffusing Dopant In Semiconductor category. First of all it is very futuristic; I guess everything new that is invented has to be in one way or another futuristic. Anyways, the point here is that this invention has some good potential for future. Inventors of this project were E. I. du Pont de Nemours and Company. The idea behind the it is very odd in a good way.
Let’s say see what the actual authors say about them: ... US007670506B1 (54) PHOTOACTIVE COMPOSITIONS FOR LIQUID DEPOSITION (75) Inventors: Daniel David LeCloux, Wilmington, DE (US); Eric M. Smith, Hockessin, ....
Here is its drawing
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METHOD FOR ETCHING SILICON NITRIDE FILMS WITH SHARP EDGE DEFINITION
Here are few examples in this category: A METHOD FOR ETCHING SILICON NITRIDE FILMS WITH SHARP EDGE DEFINITION, which seems to be dated Fri, 13 Jan 1967 00:00:00 -0800. This one is quite interesting for Diffusing Dopant In Semiconductor category. First of all it is very futuristic; I guess everything new that is invented has to be in one way or another futuristic. Anyways, the point here is that this invention has some good potential for future. Inventors of this project were . The idea behind the it is very odd in a good way.
Let’s say see what the actual authors say about them: METHOD FOR ETCHING SILICON NITRIDE FILMS WITH SHARP EDGE DEFINITION ■ Filed Jan . 13, 1967 3 Sheets-Sheet :i FIG.1 FIG..
Here is its drawing
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Method of manufacturing solid-state devices in which planar dimensional ...
Here are few examples in this category: A Method of manufacturing solid-state devices in which planar dimensional ..., which seems to be dated Wed, 03 May 1978 00:00:00 -0700. This one is quite interesting for Diffusing Dopant In Semiconductor category. First of all it is very futuristic; I guess everything new that is invented has to be in one way or another futuristic. Anyways, the point here is that this invention has some good potential for future. Inventors of this project were U.S. Philips Corporation. The idea behind the it is very odd in a good way.
Let’s say see what the actual authors say about them: Daniel [45] Mar. 17, 1981 [54] METHOD OF MANUFACTURING SOLID-STATE DEVICES IN WHICH PLANAR DIMENSIONAL DISTORTION IS REDUCED [75] Inventor: Peter J. Daniel, ....
Here is its drawing
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