Inventions in Lithography X Ray Lithography category

Introduction

Lithography X Ray Lithography is one of those areas that honestly has a lot of new inventions coming up almost every day. Of course, quality is more important than quantity but dont' forget about the element of chance. In higher sample size there is that higher probablity of somethign useful coming up.

Patented Inventions in Lithography X Ray Lithography

  1. Efficient EUV collector designs

    Here are few examples in this category: A Efficient EUV collector designs, which seems to be dated Tue, 08 Feb 2005 00:00:00 -0800. This one is quite interesting for Lithography X Ray Lithography category. First of all it is very futuristic; I guess everything new that is invented has to be in one way or another futuristic. Anyways, the point here is that this invention has some good potential for future. Inventors of this project were Intel Corporation. The idea behind the it is very odd in a good way.

    Let’s say see what the actual authors say about them: .

    Here is its drawing Efficient EUV collector designs

  3. Projection exposure apparatus and device manufacturing method

    Here are few examples in this category: A Projection exposure apparatus and device manufacturing method, which seems to be dated Fri, 11 Apr 2003 00:00:00 -0700. This one is quite interesting for Lithography X Ray Lithography category. First of all it is very futuristic; I guess everything new that is invented has to be in one way or another futuristic. Anyways, the point here is that this invention has some good potential for future. Inventors of this project were Canon Kabushiki Kaisha. The idea behind the it is very odd in a good way.

    Let’s say see what the actual authors say about them: .

    Here is its drawing Projection exposure apparatus and device manufacturing method

  5. Exposure apparatus for controlling intensity of exposure radiation

    Here are few examples in this category: A Exposure apparatus for controlling intensity of exposure radiation, which seems to be dated Thu, 31 Aug 1989 00:00:00 -0700. This one is quite interesting for Lithography X Ray Lithography category. First of all it is very futuristic; I guess everything new that is invented has to be in one way or another futuristic. Anyways, the point here is that this invention has some good potential for future. Inventors of this project were Canon Kabushiki Kaisha. The idea behind the it is very odd in a good way.

    Let’s say see what the actual authors say about them: .

    Here is its drawing Exposure apparatus for controlling intensity of exposure radiation

  7. Method and apparatus for electron beam alignment with a member by detecting ...

    Here are few examples in this category: A Method and apparatus for electron beam alignment with a member by detecting ..., which seems to be dated Thu, 18 Jul 1974 00:00:00 -0700. This one is quite interesting for Lithography X Ray Lithography category. First of all it is very futuristic; I guess everything new that is invented has to be in one way or another futuristic. Anyways, the point here is that this invention has some good potential for future. Inventors of this project were Westinghouse Electric Corporation. The idea behind the it is very odd in a good way.

    Let’s say see what the actual authors say about them: 11 12 latter alignment sequence permits alignment with the edge of the mark. The alignment system shown in FIG. 3 is what one skilled in ....

    Here is its drawing Method and apparatus for electron beam alignment with a member by detecting ...


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Searching inventions by utalizing United States Patent classification and Google patent search.

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